Quite significant purity silicon for semiconductors is obtained using the Siemens procedure; the silicon is reacted to create trichlorosilane, which happens to be first purified by distillation, then reacted with purified hydrogen on large purity silicon rods at 1150 oC to produce substantial purity, polycrystalline silicon with hydrochloric acid byproduct. https://fernandokhdbw.blog5.net/82697660/titanium-carbide-sheet-for-dummies